From left to right: Angel Yanguas-Gil, Martin Magnusson, Stacey Bent, Claire Carmalt, Annelies Delabie, and Nicolas Blasco.
"The role of surface reactivity on the coating of 3D substrates and nanostructured materials in CVD and ALD"
Argonne National Laboratories, USA
"Aerotaxy: an efficient aerosol-based method for growth of device quality semiconductor nanowires"
"Topographical and area selectivity in atomic layer deposition"
"AACVD of metal oxides: from precursor synthesis to TCOs and photocatalysts"
"Nucleation mechanisms for Chemical Vapor Deposition and Atomic Layer Deposition of 2D semiconductor materials"
"Extending ALD adoption in Sub-14nm Nodes, and Beyond Semiconductors, Through Precursors Innovation"
Contact
Henrik Pedersen
Postal address:
Linköpings Universitet
Henrik Pedersen
Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI)
581 83 Linköping
Sweden
Email:
henrik.pedersen@liu.se
Phone: +46 13 281385
Mobile: +46 73 69 11 572
Twitter: @hacp81
#cvdald17
#EuroCVD
#BalticALD