Posters Monday

Poster Session Monday, June 12

Poster format : Maximum width 90 cm

 

CVD-literature overview of metal-organic and organometallic precursors as inspiration for the Atomic Layer Deposition of Gold Marcel Junige

 

New Precursors for the Deposition of Calcium Sulfide Based Materials via AA-CVD

Peter Kubiak

 

Oxidative control over SnO and SnS depositionAndrew Johnson

New organometallic silver precursors for Aerosol Assisted CVD Carmen Jimenez

 

Silicon epitaxial growth rate increased by adding SiHx to a SiHCl3-H2 system

Hitoshi Habuka

 

Optimization of ALD processes using computational fluid dynamics simulations

Linda Jäckel

 

Simulating CVD with the DICTRA homogenization model

Axel Forslund

 

Experimental investigation and CFD-based analysis of an ALD reactor depositing alumina from TMA and water

G.P. Gakis

 

Modelling of CVD growth using kinetic Monte Carlo methods

Karl Rönnby

 

Thermodynamics and kinetics in sensor devices.Edvin Erdtman

Adsorption and diffusion of hydrocarbons at the silicon faced 4H-SiC surface studied by quantum-chemical calculations

Emil Kalered

 

The automatic system of experimental design using bio-inspired algorithms for the development of chemical vapor deposition process

Takahiro Takahashi

 

The calculation method of deposition profiles in chemical vapor deposition reactors using improved basis functions

Takahiro Takahashi

 

A combinatorial effect of substrate and surface terminating species on phase pure growth of c-BN

Karin Larsson

 

Slim vertical chemical vapour deposition reactor utilizing natural convection for Minimal Manufacturing

Hitoshi Habuka

 

Atmospheric spatial ALD process for enhanced hybrid organic-inorganic multilayer barrier thin films

Kyung-Hyun Choi

 

A novel direct liquid injection low pressure chemical vapor deposition system (DLI-LPCVD) for the deposition of thin films and nanoparticles

Mattias Vervaele

 

Vapor phase grafting of mesoporous magnesium carbonate: The case of (3-Aminopropyl)triethoxysilane and (3-Aminopropyl)trimethoxysilane

Cecilia Århammar

 

Horizontal high temperature rotating graphite drum furnace for ALD and LPCVD on particles and powdersJonas Sundqvist

PE-ALD of lithium aluminum silicon oxide solid electrolyte layers using LiHMDS

Andreas Werbrouck

 

Plasma-enhanced atomic layer deposition of nickel oxide thin films

Alexander G. Hufnagel

 

Initiated Chemical Vapor Deposition of Poly (hexafluorobutyl acrylate) Thin Films for Superhydrophobic Modification of Nanostructured Textile Surfaces

Mustafa Karaman

 

Vapor Deposition of Poly(glycidyl methacrylate) Thin Films Using A Remote Initiated CVD System

Mustafa Karaman

 

(100) Textured diamond films composed of needle-like single crystallites

Rinat Ismagilov

 

Cu barrier properties of SiCN films deposited by hot-wire chemical vapor deposition

Akira Izumi

 

Influence of plasma parameters on the growth and properties of Al2O3 thin films deposited by atomic layer deposition at 90 °C

Zhen Zhu

 

Ga amide: the resurrection towards new functional materials

Richard O'Donoghue

 

Inductively Coupled Plasma Enhanced Chemical Vapor Deposition of Crosslinked Poly (2- diisopropylamino)ethyl methacrylate

Zahide Tosun

 

Low Temperature Halide Free Metal Nitride Deposition and Effect of Periodic Plasma Treatments

Petri Raisanen

 

RF Plasma Electrostatics for the Removal of Residual Carbon and Hydrocarbons During Thin Film Growth

K. S. A. Butcher

 

Peculiarities of dynamics of graphene domains isothermal growth on Ni and Cu foils in low pressure CVD processesSergey Futko

Fe2O3–TiO2 nanocomposite systems by a hybrid PE-CVD/ALD route: growth, characterization and photocatalytic applications

Chiara Maccato

 

Au-catalyzed synthesis and structural characterization of core/shell Ge/In-Te nanowires by MOCVD

Claudia Wiemer

 

Low-temperature synthesis and properties of h-BN nanowalls with different structure

Ivan S. Merenkov

 

ALD oxidation barrier for Cu and Fe powderVeronique Cremers

Morphological, structural and tribocorrosion behaviour of TiO2 MOCVD coating on Ti substrates with different morphology

Francesca Visentin

 

AACVD of Nanostructured Zinc OxideRussell Binions*

Formation of tungsten and molybdenum disulfide micro and nanoparticles by spray pyrolysis

Kirill Tiurikov

 

Nano-ceramic composite separator modified by ALD for lithium ion batteries of improved safety and reliability

Riina Ritasalo

 

Nanocomposite ferromagnetic SiCxNy films: structure and magnetic properties

Roman Pushkarev

 

Enhanced efficiency of self-organized TiO2 nanotube layers films due to secondary materials: towards applications

Raul Zazpe

 

Improving the stability of impregnated Solid Oxide Fuel Cell electrodes using Atomic Layer DepositionDenis Cumming

Ln3+ activated CaF2 thin films: MOCVD synthesis and their energy conversion properties

Anna Lucia Pellegrino

 

Deposition features of fluoropolymer coatings by Hot Wire CVD method using nichrome filament activator

Alexey Safonov

 

Integration of CuCrO2 thin film grown by Aerosol-Assisted MOCVD in core shell ZnO nanowire heterostructure for UV photodetectors

Joao Resende

 

Atomic layer deposition for membranes applications

Mikhael Bechelany

 

ALD prepared transition metal oxides core-shell nanocomposites for photocatalytic, gas sensing and electrochromic applications

Stefan Boyadjiev

 

Process development of ALD and CVD of MoOx and MoS2 employing Mo(CO)6

Linnart Zähr

 

New Applications with Graphene on Flexible Paper Substrate

Emre ÇITAK

 

Preparation of Co-Cu oxides for low temperature applications

Zhen-Yu Tian

 

CVD-made Co-Fe spinels: synthesis, characterization and applications for the environmental emission control

Zhen-Yu Tian

 

Electron transfer processes in potassium atom collisions with ruthenium and rhodium precursors

Khrystyna Regeta

 

In Situ Infrared Spectroscopic Study on Liquid Delivery Metalorganic Chemical Vapor Deposition of Lanthanum Manganite Films

Toshihiro Nakamura

 

"In situ" study of size distribution of MoS2 particles formed by spray pyrolysis

Maxim Mishin

 

Growth mechanism studies of CuInS2 thin films deposited by Atomic Layer Deposition

Harold LE TULZO

 

Visualizing the incipient Atomic Layer Deposition of ZnO ultra thin films on InGaAs for tailoring contact resistivity

Evgenii SKOPIN

 

New single-source precursors for LPCVD synthesis of amorphous hard SiBCN films

Ivan S. Merenkov

 

CVD grown Al-TiN multi-layer wear protection coatings: structural analysis of the layers

Dirk Stiens

 

Low temperature titanium nitride ALD: low resistivity by use of ultra-high purity hydrazine

Daniel Alvarez

 

Improved mechanical properties of MT-CVD-Ti(C,N) by deposition controlled orientation

Linus von Fieandt

 

Chemical vapor deposition of silicon carbide from CH3SiCl3/H2 mixtures and alternative gas systems

Guillaume Laduye

 

Carburization of CVD-WN coatings

Johan Gerdin

 

PEALD and pulsed CVD of cobalt thin films using cyclopentadienylcobalt dicarbonyl as a precursor

Christoph Hossbach

 

Compatibility of MOCVD Cu metallization with polymer pretreatments developed for other deposition processes

Fouzi ADDOU

 

Determining absolute mechanical properties of thin films from continuous stiffness measurement data of nanoindentation of ALD oxides and their nanolaminates

Taivo Jõgiaas

 

Sponsors

Platinum:

 

 

 

 

 

Gold:

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Silver:

 

 

 

 

 

 

 

 

Copper:

Contact

 

Henrik Pedersen

 

Postal address:

Linköpings Universitet

Henrik Pedersen

Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI)

581 83 Linköping

Sweden

 

Email:

henrik.pedersen@liu.se

Phone: +46 13 281385

Mobile: +46 73 69 11 572

Twitter: @hacp81

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