Posters Tuesday

Poster Session Tuesday, June 13

Poster format : Maximum width 90 cm


ALD-metal oxide buffer layer in CIGS solar cellsJohannes Löckinger

Magnetic and Electrical Performance of Atomic Layer Deposited Erbium-Iron-Oxide Thin Films

Aile Tamm


Highly uniform Al2O3 thin films on graphene by a two-steps thermal atomic layer deposition with in-situ seed layer

Emanuela Schilirò


Alumina based adsorbents by chemical vapor infiltration of activated carbon: Investigation of the growth kinetics

Stefanie Heib


Mechanical properties of ultrathin ALD Al2O3 films

Ville Rontu


Vapor phase growth of ternary oxide nanostructures – Highly crystalline CuWO4 thin films via conventional MOCV

DAlexander Sadlo


Development of ALD methodologies for the deposition of ferroelectric metal oxide materials

Jennifer Halpin


Development of Functional Barrier Coatings on Life Science Disposables Using Plasma Enhanced Atomic Layer Deposition Michael Metzger


3D-conformal yttria-stabilized zirconia thin films via MOCVD for thermal barrier and protective applications in injection molding

Frank Mumme


RuO2/TiO2 protected Si photoanodes for water splittingKarol Frohlich

Using focused ion beam and transmission electron microscopy for examining two-and three dimensional thin film structures

Helina Seemen


Grain boundary controlled textured alumina deposited in large batches

Tommy Larsson


LPCVD boron-doped ZnO as TCO for thin film Cu(In,Ga)Se2 solar cells and its effect on device properties

Jonathan Joel


ALD metal oxides: characterization of key properties for optical coatings

Kristin Pfeiffer


Wear of textured Al2O3-based CVD coatings: A new model approach

Sebastian Öhman


Low temperature ALD films on flexible substrates Blagoy Blagoev

Atomic layer deposition of ZnO for use as an electron transport layer

Claire Burgess


AACVD of methylammonium lead triiodide for use in photovoltaic applications

Russell Binions


ALD of phase controlled tin monosulfide thin films

Oleksandr Bilousov


Azobenzene-containing inorganic-organic hybrid thin films prepared by ALD/MLD with reversible photoresponsive behaviour

Aida Khayyami


Fabrication of flexible thermoelectric devices utilizing ALD/MLD coated organic fibres

Giovanni Marin


Molecular layer deposition of transition-metal based hybrid materials

Dirk Hagen


Screening the properties of organic electrode materials deposited with ALD/MLD

Juho Heiska


Atomic/Molecular Layer Deposition of Alkali and Earth Alkaline Metal Based Carboxylate Network Thin FilmsJenna Penttinen

Large Area Spatial Atmospheric ALD for barriers

Fieke Van Den Bruele


Research in transition – R.L. Puurunen’s past research and future directions

Riikka Puurunen


Reaction mechanisms for the atomic layer deposition of Al2O3 from trimethylaluminium and O-plasma using density functional theory

Glen Fomengia


The influence of the reactor configuration and plasma operation parameters on low-temperature plasma-enhanced atomic layer deposition

Mari Napari


Time is of the essence: Using a fourth dimension to evolve CVD

Henrik Pedersen


ALD process development and material characterization for various applications

Ville Miikkulainen


A new look on ALD vanadium oxides for 3D thin-film lithium ion batteries

Felix Mattelaer


Development of novel approaches and new nanostructures

Catherine Marichy


Nanoengineering functional complex oxide thin films and nanostructures by ALD: Towards new avenues for improved functional properties

Mariona Coll


Applications of ALD oxide layers in renewable energy devices

Alexander Hufnagel


Titania nanotubes enriched with nanocrystalline hydroxyapatite as composite material of potential medical applications

Aleksandra Radtke


Encapsulation of multi-walled carbon nanotubes via rotating bed plasma enhanced chemical vapor deposition method

Mehmet Gürsoy


SELDOM: SELective Deposition of 2D Materials

Yoann Tomczak


Tilted Multi-Layer Fresnel Zone Plate Arrays for X-ray Microscopy

Umut Tunca Sanli


Selective-area atomic layer deposition using Parafilm as mask

Chao Zhang


Research on area-selective atomic layer deposition at Eindhoven University of Technology

Adrie Mackus


Comparisons between TiO2/Al2O3 nanolaminates grown by thermal and plasma enhanced atomic layer deposition: growth mechanism and material properties

Rodrigo Pessoa


Peter George Gordon, FANSSI Administrator

Peter Gordon


High-aspect ratio anodic TiO2 nanotube layers: unprecedented ability of ALD to add a functionality

Raul Zazpe


In-situ real-time Spectroscopic Ellipsometry for the investigation of Atomic Layer Processing

Marcel Junige


Electrical measurement of the conduction along the interface of negatively-charged CVD/ALD depositions on siliconLis Nanver

Atomic layer deposition of ZrO2:Fe2O3 thin films

Kristjan Kalam


Area-selective atomic layer deposition using inductively coupled plasma polymerized fluorocarbon layer: a case study for metal-oxides

Ali Haider


Thickness dependence of Li intercalation into TiO2 anatase film

Ivan Kundrata


Highly crystalline Cu2O films grown by Aerosol Assisted CVD

Carmen Jimenez


Atomic Layer Deposition of Titanium Oxide Thin Films for Various Applications

Gul Dogan


ALD-grown dielectric nanolayers for harsh-environment-resistant LMR fiber sensors

Kamil Kosiel


Atomic layer deposition of TiO2 thin films on aluminium foil: material properties and application as protective layer for food packagingRodrigo Pessoa


Growth and properties of hafnium oxide thin films atomic layer deposited from HfCl4 and O3 as hydrogen-free precursors

Raul Rammula


Boron nitride nanoporous membranes with ultra high surface charge densities

Matthieu Weber


Rhenium Thin Films by Atomic Layer Deposition

Jani Hämäläinen


HERALD ECI Network: Studies on ALD of lithium-containing materials at the University of Helsinki

Miia Mäntymäki


Hybrid inorganic-organic thin-film phosphors by ALD/MLD

Zivile Giedraityte


In situ characterizations towards tailored materials for catalysis and energy applications

Jolien Dendooven


Atomic/Molecular Layer Deposition of Inorganic-Organic Carboxylate Network Thin Films for the Applications in Microelectronics

Jenna Penttinen


ALD/MLD of inorganic organic lithium salts, solid electrolytes, and artificial solid electrolyte interfaces for lithium ion batteries

Juho Heiska


Thermoelectric devices made with novel hybrid organic-inorganic materials by ALD (research overview)

Marin Giovanni


ALD/MLD: Batteries and beyond

Mikko Nisula


Hybrid thin Films with ALD

Fabian Krahl











































Henrik Pedersen


Postal address:

Linköpings Universitet

Henrik Pedersen

Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI)

581 83 Linköping




Phone: +46 13 281385

Mobile: +46 73 69 11 572

Twitter: @hacp81

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