Posters Tuesday

Poster Session Tuesday, June 13

Poster format : Maximum width 90 cm

 

ALD-metal oxide buffer layer in CIGS solar cellsJohannes Löckinger

Magnetic and Electrical Performance of Atomic Layer Deposited Erbium-Iron-Oxide Thin Films

Aile Tamm

 

Highly uniform Al2O3 thin films on graphene by a two-steps thermal atomic layer deposition with in-situ seed layer

Emanuela Schilirò

 

Alumina based adsorbents by chemical vapor infiltration of activated carbon: Investigation of the growth kinetics

Stefanie Heib

 

Mechanical properties of ultrathin ALD Al2O3 films

Ville Rontu

 

Vapor phase growth of ternary oxide nanostructures – Highly crystalline CuWO4 thin films via conventional MOCV

DAlexander Sadlo

 

Development of ALD methodologies for the deposition of ferroelectric metal oxide materials

Jennifer Halpin

 

Development of Functional Barrier Coatings on Life Science Disposables Using Plasma Enhanced Atomic Layer Deposition Michael Metzger

 

3D-conformal yttria-stabilized zirconia thin films via MOCVD for thermal barrier and protective applications in injection molding

Frank Mumme

 

RuO2/TiO2 protected Si photoanodes for water splittingKarol Frohlich

Using focused ion beam and transmission electron microscopy for examining two-and three dimensional thin film structures

Helina Seemen

 

Grain boundary controlled textured alumina deposited in large batches

Tommy Larsson

 

LPCVD boron-doped ZnO as TCO for thin film Cu(In,Ga)Se2 solar cells and its effect on device properties

Jonathan Joel

 

ALD metal oxides: characterization of key properties for optical coatings

Kristin Pfeiffer

 

Wear of textured Al2O3-based CVD coatings: A new model approach

Sebastian Öhman

 

Low temperature ALD films on flexible substrates Blagoy Blagoev

Atomic layer deposition of ZnO for use as an electron transport layer

Claire Burgess

 

AACVD of methylammonium lead triiodide for use in photovoltaic applications

Russell Binions

 

ALD of phase controlled tin monosulfide thin films

Oleksandr Bilousov

 

Azobenzene-containing inorganic-organic hybrid thin films prepared by ALD/MLD with reversible photoresponsive behaviour

Aida Khayyami

 

Fabrication of flexible thermoelectric devices utilizing ALD/MLD coated organic fibres

Giovanni Marin

 

Molecular layer deposition of transition-metal based hybrid materials

Dirk Hagen

 

Screening the properties of organic electrode materials deposited with ALD/MLD

Juho Heiska

 

Atomic/Molecular Layer Deposition of Alkali and Earth Alkaline Metal Based Carboxylate Network Thin FilmsJenna Penttinen

Large Area Spatial Atmospheric ALD for barriers

Fieke Van Den Bruele

 

Research in transition – R.L. Puurunen’s past research and future directions

Riikka Puurunen

 

Reaction mechanisms for the atomic layer deposition of Al2O3 from trimethylaluminium and O-plasma using density functional theory

Glen Fomengia

 

The influence of the reactor configuration and plasma operation parameters on low-temperature plasma-enhanced atomic layer deposition

Mari Napari

 

Time is of the essence: Using a fourth dimension to evolve CVD

Henrik Pedersen

 

ALD process development and material characterization for various applications

Ville Miikkulainen

 

A new look on ALD vanadium oxides for 3D thin-film lithium ion batteries

Felix Mattelaer

 

Development of novel approaches and new nanostructures

Catherine Marichy

 

Nanoengineering functional complex oxide thin films and nanostructures by ALD: Towards new avenues for improved functional properties

Mariona Coll

 

Applications of ALD oxide layers in renewable energy devices

Alexander Hufnagel

 

Titania nanotubes enriched with nanocrystalline hydroxyapatite as composite material of potential medical applications

Aleksandra Radtke

 

Encapsulation of multi-walled carbon nanotubes via rotating bed plasma enhanced chemical vapor deposition method

Mehmet Gürsoy

 

SELDOM: SELective Deposition of 2D Materials

Yoann Tomczak

 

Tilted Multi-Layer Fresnel Zone Plate Arrays for X-ray Microscopy

Umut Tunca Sanli

 

Selective-area atomic layer deposition using Parafilm as mask

Chao Zhang

 

Research on area-selective atomic layer deposition at Eindhoven University of Technology

Adrie Mackus

 

Comparisons between TiO2/Al2O3 nanolaminates grown by thermal and plasma enhanced atomic layer deposition: growth mechanism and material properties

Rodrigo Pessoa

 

Peter George Gordon, FANSSI Administrator

Peter Gordon

 

High-aspect ratio anodic TiO2 nanotube layers: unprecedented ability of ALD to add a functionality

Raul Zazpe

 

In-situ real-time Spectroscopic Ellipsometry for the investigation of Atomic Layer Processing

Marcel Junige

 

Electrical measurement of the conduction along the interface of negatively-charged CVD/ALD depositions on siliconLis Nanver

Atomic layer deposition of ZrO2:Fe2O3 thin films

Kristjan Kalam

 

Area-selective atomic layer deposition using inductively coupled plasma polymerized fluorocarbon layer: a case study for metal-oxides

Ali Haider

 

Thickness dependence of Li intercalation into TiO2 anatase film

Ivan Kundrata

 

Highly crystalline Cu2O films grown by Aerosol Assisted CVD

Carmen Jimenez

 

Atomic Layer Deposition of Titanium Oxide Thin Films for Various Applications

Gul Dogan

 

ALD-grown dielectric nanolayers for harsh-environment-resistant LMR fiber sensors

Kamil Kosiel

 

Atomic layer deposition of TiO2 thin films on aluminium foil: material properties and application as protective layer for food packagingRodrigo Pessoa

 

Growth and properties of hafnium oxide thin films atomic layer deposited from HfCl4 and O3 as hydrogen-free precursors

Raul Rammula

 

Boron nitride nanoporous membranes with ultra high surface charge densities

Matthieu Weber

 

Rhenium Thin Films by Atomic Layer Deposition

Jani Hämäläinen

 

HERALD ECI Network: Studies on ALD of lithium-containing materials at the University of Helsinki

Miia Mäntymäki

 

Hybrid inorganic-organic thin-film phosphors by ALD/MLD

Zivile Giedraityte

 

In situ characterizations towards tailored materials for catalysis and energy applications

Jolien Dendooven

 

Atomic/Molecular Layer Deposition of Inorganic-Organic Carboxylate Network Thin Films for the Applications in Microelectronics

Jenna Penttinen

 

ALD/MLD of inorganic organic lithium salts, solid electrolytes, and artificial solid electrolyte interfaces for lithium ion batteries

Juho Heiska

 

Thermoelectric devices made with novel hybrid organic-inorganic materials by ALD (research overview)

Marin Giovanni

 

ALD/MLD: Batteries and beyond

Mikko Nisula

 

Hybrid thin Films with ALD

Fabian Krahl

 

Sponsors

Platinum:

 

 

 

 

 

Gold:

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Silver:

 

 

 

 

 

 

 

 

Copper:

Contact

 

Henrik Pedersen

 

Postal address:

Linköpings Universitet

Henrik Pedersen

Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI)

581 83 Linköping

Sweden

 

Email:

henrik.pedersen@liu.se

Phone: +46 13 281385

Mobile: +46 73 69 11 572

Twitter: @hacp81

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