Program Monday

Program Monday, June 12

Main Session I (Crusellhallen, Chair: Seán Barry)

09.00-09.30 Aerotaxy: an efficient aerosol-based method for growth of device quality semiconductor nanowires

Martin Magnusson

 

09.30-09.45 Hybrid ALD-CVD process for the development of decorative plasmonic nanocomposite coatingsNaoufal Bahlawane

 

09.45-10.00 Hot wire technique as a radical source for atomic layer deposition of metal and metal nitride filmsSourish Banerjee

 

10.00-10.15 Atomic-scale modelling of the atomic layer etch of Al2O3 by HF and Sn(acac)2

Simon Elliott

 

Main Session II (Crusellhallen, Chair: Seán Barry)

10.45-11.15 AACVD of metal oxides: from precursor synthesis to TCOs and photocatalysts

Claire Carmalt

 

11.15-11.30 Behavior of mixed Ta2O5 and ZrO2 films

Kaupo Kukli

 

11.30-11.45 Plasma-assisted synthesis and photo-activated hydrogen production from Fe2O3-TiO2-Au nanocomposites

Davide Barreca

 

11.45-12.00 Multilayer films of VO2/TiO2, VO2/ZnO and VO2/SnO2 for Energy Efficient Windows

Işıl Top

 

Oxide Films I (Crusellhallen, Chair: Francisco Zaera)

13.00-13.15 Novel In-complexes with high potential for MOCVD of highly transparent and conductive In2O3 thin films

Maximilian Gebhard

 

13.15-13.30 Structural differences in ALD doped HfO2 or ZrO2 films impacting ferroelectric properties

Uwe Schroeder

 

13.30-13.45 Large-area optical coatings grown by Spatial ALD

Kalle Niiranen

 

13.45-14.00 Comparison among Al2O3/HfO2 nanolaminated dielectric layers grown by plasma enhanced atomic layer deposition.Raffaella

Lo Nigro

 

14.00-14.15 Superlattices and gradient hybrid materials by ALD/MLD

Fabian Krahl

 

14.15-14.30 Advanced protective coatings by low temperature atomic layer deposition on Al surfaces for micromirror applications

Claudia Wiemer

 

New Directions in Deposition (Spegelsalen, Chair: Stacey Bent)

13.00-13.15 ALD/MLD of crystalline lithium aryloxide thin films exhibiting guest-induced structural transformation

Mikko Nisula

 

13.15-13.30 Hybrid metalorganic-inorganic systems through a combined MOCVD/MLD approach

Graziella Malandrino

 

13.30-13.45 An innovative and flexible deposition technique to fill the gap between ALD and CVD

Fabien Piallat

 

13.45-14.00 Horizontal high temperature rotating graphite drum furnace for ALD and LPCVD on particles and powders

Jonas Sundqvist

 

14.00-14.15 New materials via combinatorial atomic layer deposition

Shóna Doyle

 

14.15-14.30 Deposition of an organic-inorganic hybrid material onto carbon fibers using the pulse sequence H2O/TiCl4/furfuryl alcohol

Christian Militzer

 

Oxide Films II (Crusellhallen, Chair: Martyn Pemble)

15.00-15.15 In situ monitoring of sequential infiltration synthesis of Al2O3 in polymer thin films using spectroscopic ellipsometry

Elena Cianci

 

15.15-15.30 Surface morphology, crystallinity and electrical properties of some rare-earth oxide ALD films

Tero Pilvi

 

15.30-15.45 Process optimization, film analysis and electrical properties of Er2O3 thin films via atomic layer deposition with Er tris-guanidinate precursor and water

Lukas Mai

 

15.45-16.00 Gas-phase lithiation of ALD manganese oxide for LixMn2O4

Ville Miikkulainen

 

16.00-16.15 Synthesis of Nb2O5 thin films by thermal and plasma-enhanced atomic layer deposition

Saravana Balaji Basuvalingam

 

16.15-16.30 Tunable properties of LaMnO3±δ thin films through PI-MOCVD for advanced microelectronic devices

Carmen Jiménez

 

Carbon Films and Substrates (Spegelsalen, Chair: Annelies Delabie)

15.00-15.15 DLICVD in effluent recycling mode as an efficient deposition process of carbide protective coatings

Francis Maury

 

15.15-15.30 Microstructural characterization of the phases formed as CVD SiC contacted FeCrNi at high temperatures

Guiming Song

 

15.30-15.45 Surface reaction modeling of SiC-CVI revealed using deep micro-channels and process development for highly conformal deposition using novel sacrificial layer

Kohei Shima

 

15.45-16.00 Deformable ceramic? Nano-structured TiO2-C coating by pp-MOCVD

Susan Krumdieck

 

16.00-16.15 Novel precursor development for the atomic layer deposition of SnO and its subsequent deposition onto functionalised graphene

James Parish

 

16.15-16.30 Large scale structures in CVD-grown graphene

Alexey Kovalgin

 

 

 

 

 

 

Sponsors

Platinum:

 

 

 

 

 

Gold:

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Silver:

 

 

 

 

 

 

 

 

Copper:

Contact

 

Henrik Pedersen

 

Postal address:

Linköpings Universitet

Henrik Pedersen

Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI)

581 83 Linköping

Sweden

 

Email:

henrik.pedersen@liu.se

Phone: +46 13 281385

Mobile: +46 73 69 11 572

Twitter: @hacp81

Hash Tags for Twitter

#cvdald17

#EuroCVD

#BalticALD

Media support

Conference T-Shirt