Program Tuesday

Program Tuesday, June 13

Main Session III (Crusellhallen, Chair: Henrik Pedersen)

09.00-09.30 Topographical and area selectivity in atomic layer deposition

Stacey Bent

 

09.30-09.45 Selective growth of graphene by chemical vapour deposition on Cu-Ni alloy patterns

Hyung Gyu Park

 

09.45-10.00 Evaluation of different nanoimprint resists for a use in area-selective atomic layer deposition of selected materials

Christoph Hossbach

 

10.00-10.15 Vapour phase self-assembled monolayers for ALD blocking on 300 mm wafer scale

Sebastiaan Herregods

 

Main Session IV (Crusellhallen, Chair: Henrik Pedersen)

10.45-11.15 Extending ALD adoption in Sub-14nm Nodes, and Beyond Semiconductors, Through Precursors Innovation

Nicolas Blasco

 

11.15-11.30 AlN as an effective capping and buffer layer for MOCVD grown GdN thin films: Influence on the oxidation and crystallinty of GdN

Stefan Cwik

 

11.30-11.45 Novel ALD process based on an organic reductant for in situ deposition of metallic copper thin films

Tripurari Sharan Tripathi

 

11.45-12.00 Plasma enhanced atomic layer deposition of silver using the Ag(fod)(PEt₃)-precursor and NH₃-plasma

Matthias Minjauw

 

New Precursors (Crusellhallen, Chair: Greg Girolami)

13.00-13.15 Manganese half-sandwich compounds as MOCVD precursors for Manganese-based thin films

Andrea Preuß

 

13.15-13.30 Molecular engineering of zinc and iron precursors for spinel type zinc ferrites

Sebastian Beer

 

13.30-13.45 Using Amides for the CVD of Gallium Nitride: A Calculational and Experimental Study

Sydney Buttera

 

13.45-14.00 Thermal and plasma chemistry of trimethylboron and triethylboron in CVDMewlude Imam

 

14.00-14.15 Pulsed PECVD of SnS nanowalls using a metal-organic single source precursor

Charlotte Ruhmlieb

 

14.15-14.30 [Zn(eeki)2]: A multipurpose precursor for the deposition of zinc oxide thin films

David Zanders

 

Plasma Processes (Spegelsalen, Chair: Angel Yanguas-Gil)

13.00-13.15

In-situ removal and treatment of thin films by Ar plasma using RF substrate biasing

Agnieszka Kurek

 

13.15-13.30 µ-Plasma assisted ALD at atmospheric pressure of thin TiO2 layers

Alquin Stevens

 

13.30-13.45Plasma enhanced Atomic Layer Deposition of aluminium sulphide

Jakob Kuhs

 

13.45-14.00 Plasma-enhanced atomic layer deposition of tungstentrioxide thin films using (tBuN)2(Me2N)2W and O2 plasma

Shashank Balasubramanyam

 

14.00-14.15 Plasma CVD of first row transition metals with plasma electrons as reducing agents

Hama Nadhom

 

14.15-14.30Investigating plasma-enhanced ALD of Bi2O3 as a step towards ALD of ternary photoabsorbers for solar water splitting

Matthias Müller

 

Nanostructured Materials (Crusellhallen, Chair: Martin Magnusson)

15.00-15.15ALD deposition of Fe2O3 doped SnO2 as conversion anode for Li-ion batteries

Jeroen Kint

 

15.15-15.30 Vapor-Liquid-Solid Growth of SnO2 and β-Ga2O3 Nanowires by AP-CVD Utilizing Alternate Source Supply and Their Photoluminescence Properties

Tomoaki Terasako

 

15.30-15.45 Atomic layer deposition of titanium oxide on single layer graphene: an atomic scale study towards understanding nucleation and growth

Ivo Utke

 

15.45-16.00 XeF2 etching of silicon using ALD films as etch stop layers

Oili Ylivaara

 

16.00-16.15WS2 Chemical Vapor Deposition with WF6 and H2S: influence of the substrate

Yoann Tomczak

 

16.15-16.30 Atmospheric pressure plasma enhanced CVD of nanocomposite coatings in the "silicon dioxide (matrix)-MoS2 particles" system

Kirill Tiurikov

 

Photoactive Films (Spegelsalen, Chair: Claire Carmalt)

15.00-15.15 Thermographic phosphors: Eu doped ZrO2 by MOCVDStefanie Heib

 

15.15-15.30 Anti-reflection and biocidal coatings by flame assisted Chemical Vapour Deposition

Heather Yates

 

15.30-15.45 Atomic layer deposition of Zn(O,S) buffer layers in potassium fluoride post-deposition treated Cu(In,Ga)Se2 solar cells Fredrik Larsson

 

15.45-16.00 Atomic layer deposition for the growth of photocatalytically active titanium dioxide films doped with silver and tin

Harry Manley

 

16.00-16.15 Atomic layer deposition of transparent and conductive F-doped SnOx without HF

Goran Bacic

 

16.15-16.30 ALD of Electron Transport Layers for Perovskite Solar CellsIan Povey

 

 

Sponsors

Platinum:

 

 

 

 

 

Gold:

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

 

Silver:

 

 

 

 

 

 

 

 

Copper:

Contact

 

Henrik Pedersen

 

Postal address:

Linköpings Universitet

Henrik Pedersen

Department of Physics, Chemistry and Biology (IFM) / Chemistry (KEMI)

581 83 Linköping

Sweden

 

Email:

henrik.pedersen@liu.se

Phone: +46 13 281385

Mobile: +46 73 69 11 572

Twitter: @hacp81

Hash Tags for Twitter

#cvdald17

#EuroCVD

#BalticALD

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